【#Tech24H】SMEE showcased its self-developed new-generation front-end dry scanning projection lithography machines, the SSC800 and SSB800 (models), at the China Pavilion of the 9th China International Import Expo, marking milestone progress in China’s domestically developed front-end lithography hardware. SMEE noted the exhibit uses a transparent cutaway design to intuitively demonstrate the full optical path and internal electromechanical layout. This standardized domestic front-end lithography platform supports the mainstream I-line and KrF technical routes. Its core components - high-precision objective lens and illumination system, high-speed dual wafer stage and mask stage, integrated automated material handling system, and high-precision alignment & leveling sensing system - are independently controllable across the whole supply chain, delivering consistent process adaptability and production-grade reliability.